Figure of Merit for Optimization of Metal–Dielectric Multilayer Lenses

Author

Dongdong Li ; Dao Hua Zhang ; Changchun Yan ; Zhengji Xu

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore

Volume

13

Issue

3

fYear

2014

fDate

May-14

Firstpage

452

Lastpage

457

Abstract

We propose a figure of merit (FoM) to optimize the multilayered metal-dielectric (MD) structure for subwavelength imaging. The proposed FoM accounts both the waveguiding and transmission properties of the multilayered MD structure. We numerically demonstrate that the FoM can be used to find the optimized geometry parameters, as well as the optimized working wavelength. Such a FoM can act as an efficient tool for design and fabrication of the multilayered MD lenses.

Keywords

dielectric materials; geometrical optics; lenses; light transmission; numerical analysis; optical fabrication; optical images; optical multilayers; optical waveguides; optimisation; figure of merit; geometry parameter optimization; metal-dielectric multilayer lens design; metal-dielectric multilayer lens fabrication; subwavelength imaging; transmission properties; waveguiding properties; Anisotropic magnetoresistance; Dispersion; Filling; Imaging; Lenses; Permittivity; Slabs; Figure of merit (FoM); metal–dielectric (MD); multilayered; subwavelength imaging;

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2013.2295620

Filename

6690224