DocumentCode
3565165
Title
Will reliability limit moore´s law?
Author
Oates, Anthony S.
Author_Institution
TSMC Ltd., Hsinchu, Taiwan
fYear
2014
Abstract
Up to the present time reliability has not limited the rapid evolution of Si process technologies. However, the near future will bring a continual stream of innovations in transistor architecture and gate dielectric and interconnect materials. Maintaining historical high levels of reliability in this environment will be challenging. In this paper we discuss the reliability issues that have the potential to limit the future pace of technology progress.
Keywords
dielectric materials; semiconductor device models; semiconductor device reliability; silicon; transistors; Moore´s law; gate dielectric materials; interconnect materials; reliability; transistor architecture; Dielectrics; Integrated circuit reliability; Logic gates; Silicon; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2014 IEEE International
Type
conf
DOI
10.1109/IEDM.2014.7047092
Filename
7047092
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