• DocumentCode
    3565243
  • Title

    Atomic disorder scattering in emerging transistors by parameter-free first principle modeling

  • Author

    Qing Shi ; Lining Zhang ; Yu Zhu ; Lei Liu ; Mansun Chan ; Hong Guo

  • Author_Institution
    Dept. of Phys., McGill Univ., Montréal, QC, Canada
  • fYear
    2014
  • Abstract
    A parameter-free first principle modeling methodology is reported with emphasis on simulating effects of atomistic disorder in nano-scale transistors. The technique is based on the developed theory of nonequilibrium coherent potential approximation and a linear scaling sparse Hamiltonian implementation. Using this technique, effects of disorder scattering to the quantum transport properties of a boron-nitrogen (B-N) co-doped graphene tunnel field effect transistor (TFET) is investigated.
  • Keywords
    approximation theory; field effect transistors; graphene devices; semiconductor device models; C:B,N; TFET; atomic disorder scattering; boron-nitrogen co-doped graphene; linear scaling sparse Hamiltonian implementation; nanoscale transistors; nonequilibrium coherent potential approximation; parameter-free first principle modeling; quantum transport properties; tunnel field effect transistor; Doping; Graphene; Materials; Scattering; Semiconductor process modeling; Transistors; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2014 IEEE International
  • Type

    conf

  • DOI
    10.1109/IEDM.2014.7047144
  • Filename
    7047144