• DocumentCode
    3565741
  • Title

    Photolithography of thick photoresist coating in anisotropically etched v-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

  • Author

    Wei, Lei ; Khomtchenko, Elena ; Alkeskjold, Thomas Tanggaard ; Bjarklev, Anders

  • Author_Institution
    Dept. of Photonics Eng., Tech. Univ. of Denmark, Lyngby
  • fYear
    2009
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
  • Keywords
    holey fibres; liquid crystal devices; photonic band gap; photonic crystals; photoresists; anisotropically etched v-grooves; electrically controlled liquid crystal; electrode patterning; photolithography; photonic bandgap fiber devices; thick photoresist coating; Anisotropic magnetoresistance; Coatings; Etching; Liquid crystal devices; Lithography; Optical control; Photonic bandgap fibers; Photonic crystal fibers; Resists; Thickness control; (060.5295) Photonic crystal fibers; (220.3740) Lithography; (230.3720) Liquid-crystal devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication - incudes post deadline papers, 2009. OFC 2009. Conference on
  • Print_ISBN
    978-1-4244-2606-5
  • Electronic_ISBN
    978-1-55752-865-0
  • Type

    conf

  • Filename
    5032369
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3565741