Title :
Photolithography of thick photoresist coating in anisotropically etched v-grooves for electrically controlled liquid crystal photonic bandgap fiber devices
Author :
Wei, Lei ; Khomtchenko, Elena ; Alkeskjold, Thomas Tanggaard ; Bjarklev, Anders
Author_Institution :
Dept. of Photonics Eng., Tech. Univ. of Denmark, Lyngby
Abstract :
Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
Keywords :
holey fibres; liquid crystal devices; photonic band gap; photonic crystals; photoresists; anisotropically etched v-grooves; electrically controlled liquid crystal; electrode patterning; photolithography; photonic bandgap fiber devices; thick photoresist coating; Anisotropic magnetoresistance; Coatings; Etching; Liquid crystal devices; Lithography; Optical control; Photonic bandgap fibers; Photonic crystal fibers; Resists; Thickness control; (060.5295) Photonic crystal fibers; (220.3740) Lithography; (230.3720) Liquid-crystal devices;
Conference_Titel :
Optical Fiber Communication - incudes post deadline papers, 2009. OFC 2009. Conference on
Print_ISBN :
978-1-4244-2606-5
Electronic_ISBN :
978-1-55752-865-0
