• DocumentCode
    3565838
  • Title

    High density routing with electrical performance analysis using fine line package structure

  • Author

    Cheng-Hsun Lin ; Tsun-Lung Hsieh ; Chili-Yi Huang ; Hung-Hsiang Cheng ; Chen-Chao Wang

  • Author_Institution
    Electr. Lab., Adv. Semicond. Eng., Inc., Kaohsiung, Taiwan
  • fYear
    2014
  • Firstpage
    181
  • Lastpage
    184
  • Abstract
    In this paper, the package solutions for die-to-die interconnection including fine-line substrate and ASE advance wafer level package (aWLP) have been purposed. The fin-line substrate has 3um trace width and 3um trace space on top layer with copper interconnection. For aWLP, the trace width and space of interconnection on redistribution layer (RDL) is the same with fine-line substrate. The different materials of RDL runner have also been evaluated in this paper. For these two package types, the electrical performance is presented through six experiments. Electrical evaluations are compared through S-parameter model and R/L/C values on different design situations. Besides, the variation of impedance is also showed in this study.
  • Keywords
    copper; integrated circuit interconnections; wafer level packaging; ASE advance wafer level package; Cu; RDL; aWLP; copper interconnection; die-to-die interconnection; electrical performance analysis; fine line package structure; fine line substrate; high density routing; redistribution layer; Capacitance; Copper; Impedance; Resistance; Scattering parameters; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2014 9th International
  • Type

    conf

  • DOI
    10.1109/IMPACT.2014.7048399
  • Filename
    7048399