• DocumentCode
    3567732
  • Title

    Electrically detected magnetic resonance study of NBTI in 4H-SiC MOSFETs

  • Author

    Anders, M.A. ; Lenahan, P.M. ; Follman, J. ; Arthur, S.D. ; McMahon, J. ; Yu, L. ; Zhu, X. ; Lelis, A.J.

  • Author_Institution
    Eng. Sci. & Mech., Pennsylvania State Univ., University Park, MD, USA
  • fYear
    2014
  • Firstpage
    16
  • Lastpage
    19
  • Abstract
    SiC MOSFETs show promise for high power and high temperature applications, but bias temperature instabilities may potentially limit the performance of these devices. Utilizing electrically detected magnetic resonance (EDMR), we show that three different defect centers are generated during NBTS. Although a complete understanding of the EDMR is not yet available, the results provide strong evidence for E´ centers, hydrogen, and hydrogen complexes involvement in the NBTI phenomena.
  • Keywords
    MOSFET; magnetic resonance; negative bias temperature instability; semiconductor device reliability; silicon compounds; wide band gap semiconductors; EDMR; MOSFET; NBTI phenomena; SiC; electrically detected magnetic resonance; negative bias temperature instability; Hydrogen; MOSFET; Magnetic resonance; Silicon; Silicon carbide; Temperature dependence; Temperature measurement; NBTI; SiC; defects; magnetic resonance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IIRW), 2014 IEEE International
  • Print_ISBN
    978-1-4799-7308-8
  • Type

    conf

  • DOI
    10.1109/IIRW.2014.7049497
  • Filename
    7049497