DocumentCode :
3569794
Title :
Microelectronic applications for RF sources and accelerators
Author :
Tang, Cha-Mei
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume :
1
fYear :
1995
Firstpage :
70
Abstract :
Lithographic microfabrication techniques have been applied to the development of cathodes. In this paper, we limit the discussion of microfabricated cathodes to gated field-emitter arrays, ferroelectric and microminiature therm-ionic vacuum cathodes. These cathodes have made significant advancements in the last few years. They share in common the potential of being temporally and spatially modulated at high frequencies by low voltages with low input power requirements. These properties not only provide opportunities to improve rf power sources and accelerators, but also provide opportunities to make new commercial products
Keywords :
cathodes; ferroelectric devices; lithography; thermionic cathodes; vacuum microelectronics; RF accelerators; RF power sources; cathodes; ferroelectric cathodes; gated field-emitter arrays; lithographic microfabrication; microelectronic applications; microminiature thermionic vacuum cathodes; Acceleration; Cathodes; Electrons; Ferroelectric materials; Insulation; Laboratories; Microelectronics; Plasma accelerators; Radio frequency; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Particle Accelerator Conference, 1995., Proceedings of the 1995
Print_ISBN :
0-7803-2934-1
Type :
conf
DOI :
10.1109/PAC.1995.504569
Filename :
504569
Link To Document :
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