Title :
Residual stress analysis of HfO2/SiO2 multilayer coatings using finite element method
Author :
Chunxue Gao ; Zhiwei Zhao
Author_Institution :
Sch. of Electron. Sci. & Eng., Southeast Univ., Nanjing, China
Abstract :
HfO2/SiO2 multilayer coatings are usually applied to precise optical instruments and large optical systems. An equivalent reference temperature (ERT) technique had been proposed and used to model and evaluate the intrinsic strains of layered structures. This study has used finite element method and the equivalent reference temperature (ERT) technique to simulate the residual stress in HfO2/SiO2 multilayer coatings.
Keywords :
Poisson ratio; coatings; finite element analysis; hafnium compounds; internal stresses; multilayers; silicon compounds; stress analysis; thermal expansion; HfO2-SiO2; Poisson ratio; elastic modulus; equivalent reference temperature; finite element method; intrinsic strains; multilayer coatings; optical instruments; optical systems; residual stress analysis; thermal expansion coefficient; Coatings; Finite element analysis; Hafnium compounds; Nonhomogeneous media; Residual stresses; Substrates; HfO2/SiO2; finite element method; residual stress;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2015 IEEE International
Print_ISBN :
978-1-4799-7109-1
DOI :
10.1109/IVEC.2015.7223996
