Title :
Rotation invariant face detection using a model-based clustering algorithm
Author :
Jeon, Byeong Hwan ; Lee, SangUk ; Lee, Kyungmu
Author_Institution :
Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
Abstract :
We present a model-based clustering algorithm for locating frontal views of human faces with in-plane rotation in complex scenes, which can describe the arbitrary shape of the distributions efficiently in a feature space. An optimization technique is employed for selecting representative face and nonface models from the sample images. Image invariance properties on human faces and Hausdorff distance are used for finding the orientation of a face candidate, and the Euclidean distance and normalized correlation coefficient are used for the similarity measures between features. Three different types of feature spaces are used for the matching; binary image, graylevel image, and frequency information. Binary similarity is used for the reduction of the processing time in detecting candidate faces and their orientations in a scene, while the correlation measures of graylevel images and frequency domain features obtained by DCT (Discrete Cosine Transform) are used for the verification. Experimental results show that proposed face detection algorithm gives very high detection ratio compared to the conventional ones
Keywords :
discrete cosine transforms; face recognition; feature extraction; image matching; optimisation; Euclidean distance; Hausdorff distance; binary image; complex scenes; discrete cosine transform; experimental results; frequency information; graylevel image; image invariance; image matching; in-plane rotation; model-based clustering algorithm; normalized correlation coefficient; optimization; rotation invariant face detection; similarity measures; Clustering algorithms; Discrete cosine transforms; Euclidean distance; Face detection; Frequency domain analysis; Frequency measurement; Humans; Layout; Shape; Time measurement;
Conference_Titel :
Multimedia and Expo, 2000. ICME 2000. 2000 IEEE International Conference on
Conference_Location :
New York, NY
Print_ISBN :
0-7803-6536-4
DOI :
10.1109/ICME.2000.871564