DocumentCode :
35718
Title :
Micro-Plasma Field Effect Transistor Operating With DC Plasma
Author :
Pai, Pradeep ; Tabib-Azar, Massood
Author_Institution :
Electr. & Comput. Eng. Dept., Univ. of Utah, Salt Lake City, UT, USA
Volume :
35
Issue :
5
fYear :
2014
fDate :
May-14
Firstpage :
593
Lastpage :
595
Abstract :
This letter presents the smallest microplasma field effect transistor (MOPFET) reported to date. The MOPFET has a gaseous (atmospheric pressure He) channel and operates in the sub-Paschen breakdown regime, where the channel breakdown voltage depends (nearly) linearly on the channel length. The gate field effect is explained by noting that the channel ionization depends on the primary electron density that is controlled by both VDS and VG; negative VG increased the channel electron density lowering the channel breakdown voltage (VDS-B), whereas positive VG attracted the channel electrons and reduced their density for ionization in the channel increasing the VDS-B. A simple empirical model using Townsend breakdown criteria is developed to include the effect of the gate electric field in VDS-B.
Keywords :
atmospheric pressure; electric breakdown; electron density; field effect transistors; ionisation; plasma applications; He; MOPFET; Townsend breakdown criteria; atmospheric pressure; channel breakdown voltage; channel electron density; channel ionization; channel length; dc plasma; empirical model; gaseous channel; gate electric field; gate field effect; microplasma field effect transistor; primary electron density; sub-Paschen breakdown regime; Cathodes; Electric breakdown; Logic gates; Plasmas; Sputtering; Transistors; Atmospheric-pressure plasmas; glow discharge devices; plasma devices; plasma devices.;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2308155
Filename :
6767081
Link To Document :
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