Title :
Fabricating novel diamond waveguides using the focused ion beam hard mask
Author :
McKenzie, W. ; Hiscocks, M. ; Ladouceur, F.
Author_Institution :
Electron Microscope Unit, Univ. of New South Wales, Sydney, NSW, Australia
Abstract :
The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.
Keywords :
diamond; focused ion beam technology; integrated optics; masks; nanophotonics; optical fabrication; optical films; optical waveguides; sputter etching; thin films; C-SiO2; FIMMWAVE simulations; SiO2; diamond waveguide fabrication; diamond-on-silica thin films; direct writing; focused ion beam hard mask; nanowaveguides; plasma etching; Diamond-like carbon; Etching; Ion beams; Optical waveguides; Plasmas; FIB; diamond; hard mask; slot-waveguide; waveguide;
Conference_Titel :
Optical Fibre Technology (ACOFT), 2010 35th Australian Conference on
DOI :
10.1109/ACOFT.2010.5929925
