DocumentCode
3572090
Title
Stacked-Electrode Dynamic Memory Cells in Double Polysilicon Technology
Author
Horninger, Karlheinrich ; Meusburger, G?¼nther ; Keller, Hermann
Author_Institution
SIEMENS AG, Hofmannstr. 51 8000 M?ƒ??nchen 70 W. Germany
fYear
1977
Firstpage
111
Lastpage
114
Abstract
The double polysilicon technology can be used advantageously to design memory cells with increased storage times or higher bit density. Circuits of these cells are described and experimental as well as calculated results are presented.
Keywords
Capacitance; Circuits; Costs; Degradation; Electrodes; MOS capacitors; Random access memory; Temperature; Time measurement; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Circuits Conference, 1977. ESSCIRC '77. 3rd European
Print_ISBN
380071132X
Type
conf
Filename
5435046
Link To Document