DocumentCode
3572378
Title
Aluminum Thinning onto Blanket and Etched Back Tungsten Plugs: Simulation of Geometrical Effects
Author
Marangon, M.S. ; De Santi, G. ; Marmiroli, A. ; Pasinetti, R.
Author_Institution
SGS THOMSON MICROELECTRONICS, Via Olivetti 2, Agrate Brianza - Italia
fYear
1992
Firstpage
499
Lastpage
502
Abstract
The blanket and etch back technique has been been introduced successfully in process flows for vias and contact holes filling. The possibility of application of such technique also to stacked vias and contacts for multi-metal processes is connected to stronger requirements. A thinning of the aluminum film in the area of the plug contact sometimes has been observed. Two possible causes were considered: a reduced aluminum nucleation on the tungsten material, and geometrical effect. A work of simulation indicated that the plug recession can explain the observed thinning of aluminum. This result was also confirmed by Auger Electron Spectroscopy.
Keywords
Aluminum; Chemical vapor deposition; Etching; Filling; Microelectronics; Plugs; Shape; Solid modeling; Titanium; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
Print_ISBN
444894780
Type
conf
Filename
5435147
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