• DocumentCode
    3572378
  • Title

    Aluminum Thinning onto Blanket and Etched Back Tungsten Plugs: Simulation of Geometrical Effects

  • Author

    Marangon, M.S. ; De Santi, G. ; Marmiroli, A. ; Pasinetti, R.

  • Author_Institution
    SGS THOMSON MICROELECTRONICS, Via Olivetti 2, Agrate Brianza - Italia
  • fYear
    1992
  • Firstpage
    499
  • Lastpage
    502
  • Abstract
    The blanket and etch back technique has been been introduced successfully in process flows for vias and contact holes filling. The possibility of application of such technique also to stacked vias and contacts for multi-metal processes is connected to stronger requirements. A thinning of the aluminum film in the area of the plug contact sometimes has been observed. Two possible causes were considered: a reduced aluminum nucleation on the tungsten material, and geometrical effect. A work of simulation indicated that the plug recession can explain the observed thinning of aluminum. This result was also confirmed by Auger Electron Spectroscopy.
  • Keywords
    Aluminum; Chemical vapor deposition; Etching; Filling; Microelectronics; Plugs; Shape; Solid modeling; Titanium; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
  • Print_ISBN
    444894780
  • Type

    conf

  • Filename
    5435147