Micro-lens array fabricated by laser interference lithography

Author

Ziang Zhang ; Zuobin Wang ; Dapeng Wang

Author_Institution

CNM, Changchun Univ. of Sci. & Technol., Changchun, China

fYear

2014

Firstpage

78

Lastpage

81

Abstract

Micro-lens array (MLA) is a useful optic component. In this paper, we present a method to fabricate the MLA by three-beam laser interference lithography (LIL). Large area MLAs were obtained on photoresist. The MLA feature size was determined by controlling the incident angle of laser beams in LIL. The curvature of MLA was modified through the control of the post bake temperature and time or exposure dosage in LIL. It is convenient to adjust the size of the MLA in the laser interference lithography system. This method has the advantage of large area fabrication.

Keywords

laser materials processing; microfabrication; microlenses; photolithography; LIL; MLA; exposure dosage; incident angle control; large area fabrication; laser interference lithography system; microlens array fabrication; optic component; post bake temperature control; three-beam laser interference lithography; Arrays; Heating; Interference; Laser beams; Lenses; Optical device fabrication; Resists; Heat flow; Laser interference lithography; Micro-lens array; Positive photoresist;

fLanguage

English

Publisher

ieee

Conference_Titel

Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2014 International Conference on

Type

conf

DOI

10.1109/3M-NANO.2014.7057365

Filename

7057365