• DocumentCode
    3577120
  • Title

    Surface plasma CVD as a new technological platform for Er-doped waveguide amplifiers and lasers fabrication

  • Author

    Kholodkov, A.V. ; Golant, K.M.

  • Author_Institution
    Fiber Opt. Res. Center, Russian Acad. of Sci., Moscow, Russia
  • Volume
    2
  • fYear
    2004
  • Abstract
    Microwave-induced plasma chemical deposition is used to synthesize Er-doped nonfused glassy films. Silicate hosts with various additives are investigated. A high quantum yield of C-band luminescence is obtained at Er/sup 3+/ concentrations up to /spl sim/3/spl times/10/sup 20/cm/sup -3/.
  • Keywords
    erbium; optical fabrication; optical films; optical glass; photoluminescence; plasma CVD; plasma production; solid lasers; waveguide lasers; 4 to 8 GHz; C-band luminescence; Er-doped nonfused glassy films; Er-doped waveguide amplifiers fabrication; Er-doped waveguide lasers fabrication; microwave-induced plasma chemical deposition; quantum yield; silicate hosts; surface plasma CVD;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication Conference, 2004. OFC 2004
  • Print_ISBN
    1-55752-772-5
  • Type

    conf

  • Filename
    1362234
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3577120