DocumentCode :
3578128
Title :
Transition from junction limited to bulk limited subthreshold conduction in phase change memory
Author :
Bin Deng ; Yiqun Wei ; Dongyun Shen ; Xinnan Lin ; Xiaole Cui ; Mansun Chan ; Zhitang Song
Author_Institution :
Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
fYear :
2014
Firstpage :
1
Lastpage :
2
Abstract :
The impact of junction formed by the electrode and bulk in phase change memory to conduction at the amorphous high resistance state is studied in this paper. Analytical model deduced from basic physical equation elucidates that the current changes from junction barrier limited to bulk barrier limited when the applied voltage increases. The currents deduced from the model are in highly consistent with the measurement data at different temperatures. It is also found that the junction barrier becomes non-negligible when the radius of bottom electrode is scaled down to 20 nm.
Keywords :
electrodes; integrated circuit modelling; phase change memories; thermal analysis; amorphous high resistance state; bulk barrier; junction barrier; measurement data; phase change memory; physical equation; size 20 nm; subthreshold conduction; Optimization; Resistance; Amorphous chalcogenide; Poole Frenkel (PF) conduction; junction conduction; phase change memory (PCM); transport modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2014 IEEE International Conference on
Type :
conf
DOI :
10.1109/EDSSC.2014.7061204
Filename :
7061204
Link To Document :
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