DocumentCode
3578128
Title
Transition from junction limited to bulk limited subthreshold conduction in phase change memory
Author
Bin Deng ; Yiqun Wei ; Dongyun Shen ; Xinnan Lin ; Xiaole Cui ; Mansun Chan ; Zhitang Song
Author_Institution
Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
fYear
2014
Firstpage
1
Lastpage
2
Abstract
The impact of junction formed by the electrode and bulk in phase change memory to conduction at the amorphous high resistance state is studied in this paper. Analytical model deduced from basic physical equation elucidates that the current changes from junction barrier limited to bulk barrier limited when the applied voltage increases. The currents deduced from the model are in highly consistent with the measurement data at different temperatures. It is also found that the junction barrier becomes non-negligible when the radius of bottom electrode is scaled down to 20 nm.
Keywords
electrodes; integrated circuit modelling; phase change memories; thermal analysis; amorphous high resistance state; bulk barrier; junction barrier; measurement data; phase change memory; physical equation; size 20 nm; subthreshold conduction; Optimization; Resistance; Amorphous chalcogenide; Poole Frenkel (PF) conduction; junction conduction; phase change memory (PCM); transport modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2014 IEEE International Conference on
Type
conf
DOI
10.1109/EDSSC.2014.7061204
Filename
7061204
Link To Document