• DocumentCode
    3578128
  • Title

    Transition from junction limited to bulk limited subthreshold conduction in phase change memory

  • Author

    Bin Deng ; Yiqun Wei ; Dongyun Shen ; Xinnan Lin ; Xiaole Cui ; Mansun Chan ; Zhitang Song

  • Author_Institution
    Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
  • fYear
    2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The impact of junction formed by the electrode and bulk in phase change memory to conduction at the amorphous high resistance state is studied in this paper. Analytical model deduced from basic physical equation elucidates that the current changes from junction barrier limited to bulk barrier limited when the applied voltage increases. The currents deduced from the model are in highly consistent with the measurement data at different temperatures. It is also found that the junction barrier becomes non-negligible when the radius of bottom electrode is scaled down to 20 nm.
  • Keywords
    electrodes; integrated circuit modelling; phase change memories; thermal analysis; amorphous high resistance state; bulk barrier; junction barrier; measurement data; phase change memory; physical equation; size 20 nm; subthreshold conduction; Optimization; Resistance; Amorphous chalcogenide; Poole Frenkel (PF) conduction; junction conduction; phase change memory (PCM); transport modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2014 IEEE International Conference on
  • Type

    conf

  • DOI
    10.1109/EDSSC.2014.7061204
  • Filename
    7061204