Title :
WR-1.0 band waveguide band-pass filter based on micromachining technique
Author :
Shuang Liu ; Jiang Hu ; Yong Zhang ; Yangfan Zhou ; Dan Lei ; Li Li ; Wei Zhao ; Ruimin Xu
Author_Institution :
Fundamental Sci. on EHF Lab., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
WR-1.0 rectangular waveguide cavity band-pass filter based on micromachining technique is designed in this letter. The filter consists of two resonant cavities. A transmission zero is implemented by means of broaden stubs. The stub is broaden to the width of the resonant cavity, which simplify the fabrication. The proposed filter is fabricated using the deep reactive ion etching (DRIE) micromachining on silicon wafers, with sputtered gold inner and outer surface metallization. Using Ansoft HFSS, the center frequency of filter is 0.9THz and the transmission zero is at 0.921THz. The structure is a viable option for designs of waveguide filters at THz frequency. Effects of the DRIE process brought to the filter characteristics are also discussed in detail.
Keywords :
band-pass filters; cavity resonator filters; metallisation; micromachining; rectangular waveguides; sputter etching; waveguide filters; Ansoft HFSS; DRIE micromachining; Si; WR-1.0 band waveguide band-pass filter; deep reactive ion etching; frequency 0.9 THz; frequency 0.921 THz; micromachining technique; outer surface metallization; rectangular waveguide cavity band-pass filter; resonant cavities; silicon wafers; sputtered gold inner surface metallization; transmission zero; waveguide filters designs; Band-pass filters; Filtering theory; Gold; Micromachining; Rectangular waveguides; Resonator filters; Silicon; DRIE; Transmission zero; WR-1.0; Waveguide band-pass filter;
Conference_Titel :
Communication Problem-Solving (ICCP), 2014 IEEE International Conference on
Print_ISBN :
978-1-4799-4246-6
DOI :
10.1109/ICCPS.2014.7062215
