Title :
A micromachined 805 GHz rectangular waveguide filter on silicon wafers
Author :
Dan Lei ; Shuang Liu ; Yong Zhang ; Jiang Hu ; Li Li ; Wei Zhao ; Ruimin Xu
Author_Institution :
Fundamental Sci. on EHF Lab., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
In this letter, a WR-1.0 rectangular waveguide band-pass filter is designed, which is fabricated using the deep reactive ion etching (DRIE) micromachining on silicon wafers. The filter consists of four inductive irises. Using Ansoft HFSS, the center frequency of the filter is at 805GHz and the insertion loss is about 1.5 dB within the 21GHz bandwidth. Effects of the DRIE process brought to the filter performance are also discussed.
Keywords :
band-pass filters; micromachining; rectangular waveguides; submillimetre wave filters; waveguide filters; Ansoft HFSS; DRIE micromachining; DRIE process; WR-1.0 rectangular waveguide band-pass filter; bandwidth 21 GHz; deep reactive ion etching micromachining; filter center frequency; filter performance; frequency 805 GHz; inductive iris; insertion loss; micromachined rectangular waveguide filter; silicon wafers; Band-pass filters; Filtering theory; Micromachining; Rectangular waveguides; Resonator filters; Silicon; DRIE; WR-1.0; Waveguide band-pass filter;
Conference_Titel :
Communication Problem-Solving (ICCP), 2014 IEEE International Conference on
Print_ISBN :
978-1-4799-4246-6
DOI :
10.1109/ICCPS.2014.7062369
