DocumentCode :
3581984
Title :
High-selectivity E-Band image-reject filters in SiGe technology
Author :
Thian, Mury ; Tiebout, Marc ; Dielacher, Franz ; Fusco, Vincent
Author_Institution :
The Queen´s University of Belfast, United Kingdom
fYear :
2014
Firstpage :
271
Lastpage :
273
Abstract :
To alleviate practical limitations in the design of mm-wave on-chip image-reject filters, systematic design methods are presented. Two low-order filters with high-selectivity and low-loss characteristics are compared. The transmission zeroes are created by means of a quarter-wave transmission line (filter 1) and a series LC resonator (filter 2). Implemented on SiGe, they consume only 0.125 and 0.064 mm2 chip area including pads. The measured transmission losses across 81–86 GHz E-Band frequency range are 3.5–5 dB (filter 1) and 3–4.5 dB (filter 2) where rejection at the image frequency is greater than 30 dB.
Keywords :
Band-pass filters; Frequency shift keying; Loss measurement; Propagation losses; Resonant frequency; Resonator filters; Silicon germanium; E-band; MMIC; SiGe; image-reject filters; mm-wave; selectivity; transmission lines; transmission zero;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (APMC), 2014 Asia-Pacific
Type :
conf
Filename :
7067993
Link To Document :
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