• DocumentCode
    3583831
  • Title

    The chemistry of copper in water and related studies planned at the Advanced Photon Source

  • Author

    Dortwegt, R. ; Maughan, E.V.

  • Author_Institution
    Adv. Photon Source, Argonne Nat. Lab., IL, USA
  • Volume
    2
  • fYear
    2001
  • fDate
    6/23/1905 12:00:00 AM
  • Firstpage
    1456
  • Abstract
    Interactions between water and copper are a critical issue at most accelerators. The release rate of copper and oxides in water is affected by several variables: dissolved oxygen concentration, pH, and temperature. Relative corrosion rate, solubility data, and operating regimes are summarized based on previous work by others. Mechanisms for oxide release are discussed, and a means of pH control employing an ion exchange process is described
  • Keywords
    copper; corrosion; electron accelerators; pH; solubility; storage rings; water; APS; Advanced Photon Source; Cu; Cu-O; H2O; chemistry; corrosion rate; dissolved O concentration; ion exchange; oxide release; pH; pH control; solubility; temperature; water; Chemistry; Cooling; Copper; Corrosion; Filtration; Hydrogen; Oxygen; Stators; Throughput; Water resources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 2001. PAC 2001. Proceedings of the 2001
  • Print_ISBN
    0-7803-7191-7
  • Type

    conf

  • DOI
    10.1109/PAC.2001.986712
  • Filename
    986712