DocumentCode
3583831
Title
The chemistry of copper in water and related studies planned at the Advanced Photon Source
Author
Dortwegt, R. ; Maughan, E.V.
Author_Institution
Adv. Photon Source, Argonne Nat. Lab., IL, USA
Volume
2
fYear
2001
fDate
6/23/1905 12:00:00 AM
Firstpage
1456
Abstract
Interactions between water and copper are a critical issue at most accelerators. The release rate of copper and oxides in water is affected by several variables: dissolved oxygen concentration, pH, and temperature. Relative corrosion rate, solubility data, and operating regimes are summarized based on previous work by others. Mechanisms for oxide release are discussed, and a means of pH control employing an ion exchange process is described
Keywords
copper; corrosion; electron accelerators; pH; solubility; storage rings; water; APS; Advanced Photon Source; Cu; Cu-O; H2O; chemistry; corrosion rate; dissolved O concentration; ion exchange; oxide release; pH; pH control; solubility; temperature; water; Chemistry; Cooling; Copper; Corrosion; Filtration; Hydrogen; Oxygen; Stators; Throughput; Water resources;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 2001. PAC 2001. Proceedings of the 2001
Print_ISBN
0-7803-7191-7
Type
conf
DOI
10.1109/PAC.2001.986712
Filename
986712
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