Title :
OBIRCH based on differential imaging locating method
Author :
Xiaoling Lin ; Hongqi Zhang
Author_Institution :
Sci. & Technol. on Reliability Phys. & Applic. of Electr. Component Lab., Res. Inst., Guangzhou, China
Abstract :
Optical Beam Induced Resistance Change (OBIRCH) is a common method to detect IC resistive/short failure based on the thermal effect stimulated by laser scanning. When the bias voltage is low, OBIRCH may face the problems of weak failure signal, poor quality of OBIRCH image influenced by the noise. To solve these problems and improve the precision of OBIRCH a signal-noise model of OBIRCH is established and a differential image locating algorithm is designed. First, two groups of image with different failure signal strength by adjusting bias voltage are acquired and mean difference image of these two group images is obtained by calculating. Then, mean filter and image binarized are performed and get a statistical image. Failure point can be effectively located according to the statistical image. The accuracy of OBIRCH based on differential imaging locating method has been proved by physical analysis.
Keywords :
failure analysis; filters; image processing; optical scanners; IC resistive/short failure; OBIRCH; bias voltage; binarized image; differential imaging locating method; failure signal strength; laser scanning; mean filter; optical beam induced resistance change; signal-noise model; statistical image; thermal effect; Failure analysis; Imaging; Integrated circuits; Laser modes; Noise; Reliability; Resistance; OBIRCH; defect localization; differential imaging method; signal-noise model;
Conference_Titel :
Reliability, Maintainability and Safety (ICRMS), 2014 International Conference on
Print_ISBN :
978-1-4799-6631-8
DOI :
10.1109/ICRMS.2014.7107185
