DocumentCode
3592046
Title
3D Interferometric Microscope for Topography and Real Color Imaging in Industrial Applications
Author
Schmit, Joanna
Author_Institution
Nano Surfaces Div., Bruker Inc., Tucson, AZ, USA
fYear
2014
Firstpage
250
Lastpage
252
Abstract
This paper describes an application for 3D microscopes based on white light interferometry as a metrology tool for certain applications in the semiconductor industry. One application is the measurement of narrow and high aspect ratios through silicon vias. Another application has more visual and detection aspects of sample evaluation based on a real color image of a measured sample as obtained with white light interferometry.
Keywords
elemental semiconductors; light interferometry; optical microscopes; silicon; Si; Color; Image color analysis; Lighting; Microscopy; Optical interferometry; Semiconductor device measurement; Three-dimensional displays; 3D microscopy; color imaging in interferometry; through silicon via; white light interferometry;
fLanguage
English
Publisher
ieee
Conference_Titel
Optomechatronic Technologies (ISOT), 2014 International Symposium on
Type
conf
DOI
10.1109/ISOT.2014.67
Filename
7119431
Link To Document