Title :
3D Interferometric Microscope for Topography and Real Color Imaging in Industrial Applications
Author_Institution :
Nano Surfaces Div., Bruker Inc., Tucson, AZ, USA
Abstract :
This paper describes an application for 3D microscopes based on white light interferometry as a metrology tool for certain applications in the semiconductor industry. One application is the measurement of narrow and high aspect ratios through silicon vias. Another application has more visual and detection aspects of sample evaluation based on a real color image of a measured sample as obtained with white light interferometry.
Keywords :
elemental semiconductors; light interferometry; optical microscopes; silicon; Si; Color; Image color analysis; Lighting; Microscopy; Optical interferometry; Semiconductor device measurement; Three-dimensional displays; 3D microscopy; color imaging in interferometry; through silicon via; white light interferometry;
Conference_Titel :
Optomechatronic Technologies (ISOT), 2014 International Symposium on
DOI :
10.1109/ISOT.2014.67
