DocumentCode
3596579
Title
Admittance spectroscopy and capacitance dispersion of AlGaN/GaN hetero-structures
Author
Kaushik, Janesh K. ; Balakrishnan, V. Raman ; Panwar, Brishbhan Singh ; Muralidharan, Rangarajan
Author_Institution
Solid State Phys. Lab., New Delhi, India
fYear
2014
Firstpage
1
Lastpage
4
Abstract
Admittance spectroscopy of pristine AlGaN/GaN metal-semiconductor interface reveals the distributed trap activation energy in the order of 0.24 eV by mercury probe capacitance-voltage (C-V) measurements. The trap densities of states (Dit) of these traps were extracted in the range of ~1.9×1012 eV-1cm-2 with the reverse bias voltage ranging from -5 Volts to 0 Volt. A very good fitting of admittance spectra (G/ω) was obtained by using the time constants of these traps. The dispersion in the capacitance was corrected to obtain an accurate depth profile of the hetero-structures.
Keywords
III-V semiconductors; aluminium compounds; capacitance; electric admittance; electronic density of states; gallium compounds; semiconductor-metal boundaries; wide band gap semiconductors; AlGaN-GaN; admittance spectra; admittance spectroscopy; capacitance dispersion; distributed trap activation energy; heterostructures; mercury probe capacitance-voltage measurements; metal-semiconductor interface; reverse bias voltage; trap densities of states; Aluminum gallium nitride; Capacitance; Gallium nitride; HEMTs; MODFETs; Semiconductor device measurement; Wide band gap semiconductors;
fLanguage
English
Publisher
ieee
Conference_Titel
Emerging Electronics (ICEE), 2014 IEEE 2nd International Conference on
Print_ISBN
978-1-4673-6527-7
Type
conf
DOI
10.1109/ICEmElec.2014.7151157
Filename
7151157
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