DocumentCode :
3596594
Title :
A novel partially insulated junctionless transistor for low power nanoscale digital integrated circuits
Author :
Patil, Ganesh C. ; Bonge, Vijaysinh H. ; Malode, Mayur M. ; Jain, Rahul G.
Author_Institution :
Dept. of Electron. & Telecommun. Eng., Savitribai Phule Pune Univ., Pune, India
fYear :
2014
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, a novel device structure named as partially insulated (Pi-OX) junctionless transistor (JLT) is proposed and the simulated results below 20 nm have been compared with existing silicon-on-insulator (SOI) JLT. Further, drain-induced barrier lowering (DIBL), subthreshold swing (SS), on-state drive current (ION), off-state leakage current (IOFF), ION/IOFF ratio and static power dissipation (PSTAT) of the proposed Pi-OXJLT and SOIJLT has also been compared. It has been found that, IOFF, DIBL and SS in the case of proposed Pi-OXJLT are reduced by 57%, 17% and 10% respectively over the existing SOIJLT device. The fabrication flow of the proposed Pi-OXJLT is proposed.
Keywords :
digital integrated circuits; field effect transistors; leakage currents; low-power electronics; semiconductor device models; DIBL; device structure; drain-induced barrier lowering; low power nanoscale digital integrated circuits; off-state leakage current; on-state drive current; partially insulated junctionless transistor; static power dissipation; subthreshold swing; Fabrication; Logic gates; MOSFET; Nanoscale devices; Performance evaluation; Silicon; Junctionless transistor; Short channel effects; partially insulated buried oxide; scaling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Emerging Electronics (ICEE), 2014 IEEE 2nd International Conference on
Print_ISBN :
978-1-4673-6527-7
Type :
conf
DOI :
10.1109/ICEmElec.2014.7151171
Filename :
7151171
Link To Document :
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