Ge/TiO2 composite thin films prepared by RF magnetron sputtering for photovoltaic applications

Author

Ibrahim, Anis Syukriah ; Khan, Abdul Faheem ; Abd Binti Razak, Bushroa

Author_Institution

UM Power Energy Dedicate Res. Centre, Univ. of Malaya, Kuala Lumpur, Malaysia

fYear

2014

Firstpage

1

Lastpage

5

Abstract

The Ge/TiO₂ composite thin films are deposited on polyimide substrate by RF sputtering method. The aim of this work is to develop a flexible and affordable solar cells material using Ge/TiO₂ composite thin films. The films are deposited by varying sputtering times from 30 to 60 minutes. The surface morphological and structural composition of the thin films are studied by FESEM and X-ray diffraction. FESEM image shows the distribution of elements and the cross section of Ge/TiO2 composite thin films. XRD patterns reveal the morphology structural changes from amorphous to crystalline phase with increasing sputtering time.

Keywords

X-ray diffraction; composite materials; germanium; scanning electron microscopy; semiconductor thin films; solar cells; sputtering; surface morphology; titanium compounds; FESEM; Ge-TiO₂; RF magnetron sputtering; XRD; composite thin film; photovoltaic application; polyimide substrate; solar cell; surface morphological; x-ray diffraction; Germanium; RF sputtering; Titania; thin films;

fLanguage

English

Publisher

iet

Conference_Titel

Clean Energy and Technology (CEAT) 2014, 3rd IET International Conference on

Print_ISBN

978-1-78561-069-1

Type

conf

DOI

10.1049/cp.2014.1482

Filename

7151644