Infrared micromirror array with large pixel size and large deflection angle

Author

Wagner, B. ; Riemer, K. ; Maciossek, A. ; Hofmann, U.

Author_Institution

Fraunhofer-Inst. fur Silicon Technol., Wurzburg, Germany

Volume

1

fYear

1997

Firstpage

75

Abstract

The paper presents a technological study for the realization of micromirrors which have both, a large pixel size (100 μm×100 μm) and a large mirror deflection angle (±15°). This specification requires a 13 μm gap for electrostatic actuation. A metal surface micromachining process has been developed using thick resist UV-lithography, multiple electroplating, a copper sacrificial layer and a polishing process step. Using nonplanar electrodes the driving voltage of electrostatic actuators can be reduced by factors. Two different technologies to realize tapered electrodes are presented

Keywords

copper; electroplating; electrostatic devices; integrated optics; lithography; microactuators; micromachining; mirrors; polishing; 13 mum; Cu; IR micromirror array; copper sacrificial layer; driving voltage; electrostatic actuation; electrostatic actuator; large deflection angle; metal surface micromachining; mirror deflection angle; multiple electroplating; nonplanar electrodes; polishing; tapered electrodes; thick resist UV-lithography; Electrodes; Electrostatic actuators; Micromachining; Micromirrors; Mirrors; Optical arrays; Optical modulation; Paper technology; Torque; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.613585

Filename

613585