DocumentCode
3598408
Title
Large-area linear and nonlinear nanophotonics
Author
Brueck, S.R.J.
Author_Institution
Center for High Technol. Mater., Univ. of New Mexico, Albuquerque, NM, USA
fYear
2009
Firstpage
1
Lastpage
1
Abstract
Interferometric lithography provides a facile technique for the fabrication of large-areas of nanophotonic structures. Examples of both linear and nonlinear responses will be drawn from plasmonics, metamaterials, and photonic crystals.
Keywords
light interferometry; metamaterials; nanophotonics; nonlinear optics; optical fabrication; optical materials; photolithography; photonic crystals; plasmonics; fabrication technique; interferometric lithography; metamaterial; nonlinear nanophotonics; optical lithography; photonic crystal; plasmonics; High speed optical techniques; Interferometric lithography; Magnetic materials; Metamaterials; Nanophotonics; Nonlinear optics; Optical harmonic generation; Optical interferometry; Optical ring resonators; Plasmons; (160.3918) metamaterials; 190.0190 (nonlinear optics);
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Print_ISBN
978-1-55752-869-8
Electronic_ISBN
978-1-55752-869-8
Type
conf
Filename
5225233
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