Title :
Polysilicon Emitter Resistance and Carrier Transport Studies
Author :
Stork, J.M.C. ; Wong, C.Y. ; Arienzo, M.
Author_Institution :
IBM Research Center, P.O. Box 218, Yorktown Heights, NY 10598 (914) 945-2848
Keywords :
Annealing; Chemical technology; Contact resistance; Current density; Diodes; Doping; Electric resistance; Silicon; Temperature; Very large scale integration;
Conference_Titel :
VLSI Technology, 1985. Digest of Technical Papers. Symposium on
Print_ISBN :
4-930813-09-3
