Title :
Anodic Si3N4 Grown in a New Plasma Reactor
Author :
Wong, S.S. ; Oldham, W.G. ; Grinolds, H.R.
Author_Institution :
University of California, Berkeley, Ca. 94720
Keywords :
Boats; Furnaces; Inductors; Optical films; Plasma applications; Plasma materials processing; Plasma properties; Plasma temperature; Semiconductor films; Silicon;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Print_ISBN :
4-930813-05-0
