DocumentCode
3598563
Title
Anodic Si3N4 Grown in a New Plasma Reactor
Author
Wong, S.S. ; Oldham, W.G. ; Grinolds, H.R.
Author_Institution
University of California, Berkeley, Ca. 94720
fYear
1983
Firstpage
88
Lastpage
89
Keywords
Boats; Furnaces; Inductors; Optical films; Plasma applications; Plasma materials processing; Plasma properties; Plasma temperature; Semiconductor films; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Print_ISBN
4-930813-05-0
Type
conf
Filename
4480650
Link To Document