DocumentCode :
3599491
Title :
Freestanding submillimetre wave FSS technology
Author :
Dickie, R. ; Cahill, R. ; Fusco, V. ; Mitc, N.
Author_Institution :
Inst. of Electron., Commun. & Inf. Technol., Queen´´s Univ. Belfast, Belfast, UK
fYear :
2011
Firstpage :
1444
Lastpage :
1448
Abstract :
In this paper we report on two methods of fabricating Frequency Selective Surfaces (FSS) which are designed to give a polarisation independent band pass filter response centred at 321 GHz. One of the designs is based on metal encapsulated polymer while a later version uses silicon on insulator (SOI) as the structural material. The fabrication of the devices was carried out in a clean room laboratory using precision micromachining and plating processes. These include the use of reactive ion etching (RIE) to pattern the individual slots and deep RIE to remove the substrate underneath. This process yields a Freestanding FSS which can be duplicated to form multilayer structures with enhanced filtering performance. Quasi-optical transmission measurements in the 290 GHz - 360 GHz range yield spectral transmission coefficients which are in close agreement with the numerical predictions.
Keywords :
band-pass filters; frequency selective surfaces; micromachining; silicon-on-insulator; sputter etching; submillimetre wave filters; freestanding submillimetre wave FSS technology; frequency 290 GHz to 360 GHz; frequency selective surfaces; metal encapsulated polymer; micromachining process; plating process; polarisation independent band pass filter; reactive ion etching; silicon on insulator; structural material; Fabrication; Frequency selective surfaces; Polymers; Remote sensing; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Antennas and Propagation (EUCAP), Proceedings of the 5th European Conference on
Print_ISBN :
978-1-4577-0250-1
Type :
conf
Filename :
5781782
Link To Document :
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