Title :
New bifocal pinch experiment speed 3
Author :
Raacke, J. ; Berntien, U. ; Decker, G. ; Kies, W. ; Rowekamp, P.
Author_Institution :
Heinrich-Heine- Universität Düsseldorf, Inst. für Experimentalphysik, Universitätsstr. 1, 40225, Germany
Abstract :
Intense sources in the spectral range of VUV- to SXR-radiation (λ= 200 … 0.05 nm) are used for e.g. micro lithography or X-ray microscopy. These applications require intense short radiation pulses emitted in small spectral channels from a spot-like source. For technical applications a compact and transportable design in combination with easy maintenance is also desired.
Conference_Titel :
High-Power Particle Beams, 1996 11th International Conference on
Print_ISBN :
978-80-902250-3-9
