• DocumentCode
    3601404
  • Title

    Microfabricated Retarding Potential Analyzers With Enforced Aperture Alignment for Improved Ion Energy Measurements in Plasmas

  • Author

    Heubel, Eric Vincent ; Velasquez-Garcia, Luis Fernando

  • Author_Institution
    Dept. of Mech. Eng., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • Volume
    24
  • Issue
    5
  • fYear
    2015
  • Firstpage
    1355
  • Lastpage
    1369
  • Abstract
    We report novel retarding potential analyzers (RPAs) intended to measure the ion energy distribution of cold, high-density plasmas (λD > 50 μm, i.e., Te/ni ≥ 5.25 × 10-13 K·m-3, e.g., Te ~ 2 eV and ni ~ 5 × 1016 m-3; total pressure ~40 mTorr). By scaling down the electrode apertures and electrode separation, densely packing apertures in each electrode, and enforcing interelectrode aperture alignment, the sensor measures ion energy distribution with larger signal-to-noise ratio and resolution compared with a conventional RPA. Two implementations are demonstrated, i.e., a hybrid retarding potential analyzer (RPA) with microfabricated grids and precision-machined housing, and a fully microfabricated microelectromechanical systems (MEMS) RPA with deflection springs that enforce aperture alignment across the electrode grid stack. Using an ion source, the MEMS RPA generated data with an order of magnitude larger signal and one third the peak width compared with the data from a conventional RPA. Unlike the conventional RPA, the hybrid and MEMS RPAs were able to measure the ion energy distribution of high-density plasma from a helicon source over a wide range of power levels; however, the MEMS RPA generated data with larger signal strength and resolution, with as much as a 200-fold increase in signal strength and less than half the full width at half maximum, compared with the data from the hybrid RPA. The hybrid RPA and MEMS RPA plasma data are consistent with measurements from an independent double Langmuir probe installed in the facility.
  • Keywords
    Langmuir probes; plasma sources; plasma transport processes; cold plasmas; electrode grid stack; high-density plasmas; hybrid MEMS RPA plasma data; hybrid retarding potential analyzer; independent double Langmuir probe; interelectrode aperture alignment; ion energy distribution measurement; ion source; microelectromechanical systems; signal-to-noise ratio; Apertures; Electrodes; Energy measurement; Micromechanical devices; Plasma measurements; Plasmas; Springs; Charged-particle energy measurement; deep-reactive ion etching (DRIE); fusion-bonded wafer stack; plasma MEMS; plasma diagnostics; spring MEMS assembly; spring MEMS assembly.;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2015.2399373
  • Filename
    7047213