Generalized Predictive Control of Temperature on an Atomic Layer Deposition Reactor

Author

Wen-Jie He ; Hai-Tao Zhang ; Zhiyong Chen ; Bo Chu ; Kun Cao ; Bin Shan ; Rong Chen

Author_Institution

State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China

Volume

23

Issue

6

fYear

2015

Firstpage

2408

Lastpage

2415

Abstract

This brief establishes a closed-loop control system for a radiant heating atomic layer deposition (ALD) reactor using generalized predictive control (GPC). The GPC-based closed-loop control system can rapidly and precisely stabilize the temperature in the presence of external disturbances. Compared with the conventional open-loop control and the proportional-integral-differential control, the closed-loop GPC system enhances the processing efficiency between every ALD run by substantially reducing settling time with impact by external disturbances. The attenuated temperature fluctuation leads to more uniform thin-film morphologies that fulfill the technical requirements of ALD processes.

Keywords

PI control; atomic layer deposition; closed loop systems; heat radiation; predictive control; temperature control; GPC-based closed-loop control system; generalized predictive control; open-loop control; proportional-integral-differential control; radiant heating ALD reactor; radiant heating atomic layer deposition reactor; temperature control; thin-film morphologies; Atomic layer deposition; Predictive control; Temperature control; Thin films; Atomic layer deposition (ALD); external disturbance; nanometer thin film; predictive control; temperature control; temperature control.;

fLanguage

English

Journal_Title

Control Systems Technology, IEEE Transactions on

Publisher

ieee

ISSN

1063-6536

Type

jour

DOI

10.1109/TCST.2015.2404898

Filename

7067403