Title :
Thermally Engineered Flip-Chip InGaN/GaN Well-Ordered Nanocolumn Array LEDs
Author :
Hayashi, Hiroaki ; Fukushima, Daishi ; Noma, Tomohiro ; Tomimatsu, Daisuke ; Konno, Yuta ; Mizuno, Makoto ; Kishino, Katsumi
Author_Institution :
Sophia Univ., Tokyo, Japan
Abstract :
Thermally engineered flip-chip (FC) InGaN/GaN well-ordered nanocolumn array light-emitting diodes (LEDs) are demonstrated for the first time. A directional photoluminescence beam profile was observed from the n-side bottom of the GaN nanocolumns, which maintained an optically damage-free periodic arrangement of nanocolumns through the FC process involving Si substrate removal by wet etching. The developed LED achieved single-peak emission at ~ 570 nm in the middle of the visible range. The thermal resistance of the nanocolumn LED was significantly reduced using the FC configuration.
Keywords :
III-V semiconductors; etching; flip-chip devices; gallium compounds; indium compounds; light emitting diodes; light sources; nanostructured materials; optical materials; photoluminescence; silicon; thermal resistance; thermo-optical devices; FC configuration; InGaN-GaN; Si; Si substrate removal; directional photoluminescence beam profile; optically damage-free periodic arrangement; single-peak emission; thermal resistance; thermally engineered flip-chip InGaN-GaN well-ordered nanocolumn array LED; thermally engineered flip-chip InGaN-GaN well-ordered nanocolumn array light-emitting diodes; visible spectrum; wavelength 570 nm; wet etching; Aluminum nitride; Arrays; Gallium nitride; Light emitting diodes; Silicon; Substrates; Thermal resistance; Electroluminescence; Flip-chip devices; Indium gallium nitride; Light emitting diodes; flip-chip devices; indium gallium nitride; light emitting diodes;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2015.2463756