Technology/System Codesign and Benchmarking for Lateral and Vertical GAA Nanowire FETs at 5-nm Technology Node

For sub-7-nm technology nodes, the gate-all-around (GAA) nanowire-based device structure is a strong candidate to sustain scaling according to Moore´s Law. For the first time, the performance of two GAA device options- lateral FET (LFET) and vertical FET (VFET)-is benchmarked and analyzed at the system level using an ARM core processor, based on realistic compact device models at the 5-nm technology node. Tradeoffs among energy, frequency, leakage, and area are evaluated by a multi-V_th optimization flow. A variety of relevant device configurations, including various number of fins, nanowires, and nanowire stacks, are explored. The results demonstrate that an LFET GAA core has a larger maximum frequency than its VFET counterpart because the channel stress that can be created in the LFETs results in a larger ON current. For fast timing targets, the LFET cores are therefore superior. However, for slow timing targets (e.g., 5 ns), the VFET cores with three nanowires offer a 7% area reduction and a 20% energy saving compared with the LFET cores with 2fin/2stack at the same leakage power.