DocumentCode
3604345
Title
Capacitance Expressions and Electrical Characterization of Tapered Through- Silicon Vias for 3-D ICs
Author
Jinrong Su ; Fang Wang ; Wenmei Zhang
Author_Institution
Coll. of Phys. & Electron., Shanxi Univ., Taiyuan, China
Volume
5
Issue
10
fYear
2015
Firstpage
1488
Lastpage
1496
Abstract
Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through-silicon vias (T-TSVs) are proposed. The expressions are suitable for TSVs with high aspect ratio (thin and long). The maximum percentage errors between the calculated and simulated results for the insulator capacitance and the substrate capacitance are 1.86% and 3.75%, respectively. Then the equivalent circuit model of the T-TSV signal-ground pair is established and validated by comparison with the full-wave simulation results. Furthermore, the electrical characteristics of the T-TSV are evaluated with the proposed expressions. The results indicate that the T-TSV has longer latency and less crosstalk than the cylindrical TSVs.
Keywords
equivalent circuits; insulators; three-dimensional integrated circuits; 3D IC; T-TSV signal-ground pair; capacitance expressions; electrical characterization; equivalent circuit; parasitic insulator capacitance; substrate capacitance; tapered through-silicon vias; Capacitance; Equivalent circuits; Insulators; Integrated circuit modeling; Silicon; Substrates; Through-silicon vias; Insulator capacitance; metal-oxide-semiconductor (MOS) effect; substrate capacitance; tapered through-silicon vias (T-TSVs); tapered through-silicon vias (T-TSVs).;
fLanguage
English
Journal_Title
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
2156-3950
Type
jour
DOI
10.1109/TCPMT.2015.2457938
Filename
7182315
Link To Document