• DocumentCode
    3604345
  • Title

    Capacitance Expressions and Electrical Characterization of Tapered Through- Silicon Vias for 3-D ICs

  • Author

    Jinrong Su ; Fang Wang ; Wenmei Zhang

  • Author_Institution
    Coll. of Phys. & Electron., Shanxi Univ., Taiyuan, China
  • Volume
    5
  • Issue
    10
  • fYear
    2015
  • Firstpage
    1488
  • Lastpage
    1496
  • Abstract
    Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through-silicon vias (T-TSVs) are proposed. The expressions are suitable for TSVs with high aspect ratio (thin and long). The maximum percentage errors between the calculated and simulated results for the insulator capacitance and the substrate capacitance are 1.86% and 3.75%, respectively. Then the equivalent circuit model of the T-TSV signal-ground pair is established and validated by comparison with the full-wave simulation results. Furthermore, the electrical characteristics of the T-TSV are evaluated with the proposed expressions. The results indicate that the T-TSV has longer latency and less crosstalk than the cylindrical TSVs.
  • Keywords
    equivalent circuits; insulators; three-dimensional integrated circuits; 3D IC; T-TSV signal-ground pair; capacitance expressions; electrical characterization; equivalent circuit; parasitic insulator capacitance; substrate capacitance; tapered through-silicon vias; Capacitance; Equivalent circuits; Insulators; Integrated circuit modeling; Silicon; Substrates; Through-silicon vias; Insulator capacitance; metal-oxide-semiconductor (MOS) effect; substrate capacitance; tapered through-silicon vias (T-TSVs); tapered through-silicon vias (T-TSVs).;
  • fLanguage
    English
  • Journal_Title
    Components, Packaging and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    2156-3950
  • Type

    jour

  • DOI
    10.1109/TCPMT.2015.2457938
  • Filename
    7182315