DocumentCode :
3604672
Title :
Dual-Frequency Megasonic Waveguide for Nano-Pattern Cleaning
Author :
Hyunse Kim ; Yanglae Lee ; Euisu Lim
Author_Institution :
Korea Inst. of Machinery & Mater., Daejeon, South Korea
Volume :
28
Issue :
4
fYear :
2015
Firstpage :
521
Lastpage :
527
Abstract :
In this paper, a dual-frequency megasonic waveguide that is operated simultaneously by 1 and 3 MHz operating frequency, was designed and fabricated. Finite element analysis using ANSYS software was performed to design the waveguide. The predicted anti-resonance frequency (the maximum peak value of a impedance curve) for a 1 MHz piezoelectric actuator was 1000 kHz, which was in good agreement with the experimental result of 995 kHz with 0.5% error. In addition, the predicted anti-resonance frequency for a 3 MHz megasonic waveguide was 2998 kHz, which coincided with the experimental value. After manufacturing the system, acoustic pressures were measured and average acoustic pressures were calculated. As a result, average values for 1 and 3 MHz operating frequency, increased by 59.0% and 71.5%, respectively. Finally, a pattern damage test was performed with 45 nm poly-Si patterns under 4.5 W power supply for 1 MHz and 7.5 W for 3 MHz, respectively. Consequently, no pattern damage was observed. Considering these results, it is thought that the developed dual-frequency megasonic waveguide will be applicable in nano-pattern cleaning with improved efficiency.
Keywords :
acoustic waveguides; cleaning; finite element analysis; nanopatterning; piezoelectric actuators; pressure measurement; silicon; ANSYS software; Si; acoustic pressures; antiresonance frequency; dual-frequency megasonic waveguide; finite element analysis; frequency 1 MHz; frequency 2998 kHz; frequency 3 MHz; frequency 995 kHz; impedance curve; nanopattern cleaning; pattern damage test; piezoelectric actuator; power 7.5 W; Acoustic measurements; Cleaning; Finite element analysis; Nanoparticles; Nanopatterning; Piezoelectric actuators; Semiconductor device measurement; Finite element method (FEM); Megasonic; Nano-particle cleaning; finite element method (FEM); nano-particle cleaning;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2015.2469739
Filename :
7208863
Link To Document :
بازگشت