DocumentCode
3604784
Title
Above-Threshold
Noise Expression for Amorphous InGaZnO Thin-Film Transistors Considering Series Resistance Noise
Author
Hongyu He ; Xueren Zheng ; Shengdong Zhang
Author_Institution
Shenzhen Grad. Sch., Sch. of Electron. & Comput. Eng., Peking Univ., Shenzhen, China
Volume
36
Issue
10
fYear
2015
Firstpage
1056
Lastpage
1059
Abstract
The 1/f noise expression is presented for the amorphous InGaZnO thin-film transistors (TFTs) at low drain voltage. Considering the mobility power-law parameter α in the TFTs, Ghibaudo´s carrier number fluctuation model with the series resistance noise is applied to obtain the analytical normalized drain current noise power spectral density expression. The expression is compared with the numerical calculation, and verified by the available experimental data.
Keywords
1/f noise; semiconductor device models; semiconductor device noise; thin film transistors; InGaZnO; Analytical models; Low-frequency noise; Resistance; Silicon; Thin film transistors; InGaZnO (IGZO); Thin-film transistor (TFT); low frequency noise; series resistance noise;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2015.2469723
Filename
7214228
Link To Document