DocumentCode :
3607252
Title :
Noise-Induced Resistance Broadening in Resistive Switching Memory—Part I: Intrinsic Cell Behavior
Author :
Ambrogio, Stefano ; Balatti, Simone ; McCaffrey, Vincent ; Wang, Daniel C. ; Ielmini, Daniele
Author_Institution :
Dipt. di Elettron., Inf. e Bioingegneria, Politec. di Milano, Milan, Italy
Volume :
62
Issue :
11
fYear :
2015
Firstpage :
3805
Lastpage :
3811
Abstract :
Resistive-switching memory (RRAM) is attracting a widespread interest for its outstanding properties, such as low power, high speed, and good endurance. A crucial concern for RRAM is the current fluctuation, which induces significant broadening of resistance levels in single-bit and multilevel applications. This paper addresses low-frequency fluctuations focusing on 1/f and random telegraph noise contributions in intrinsic, i.e., typical, cells. The current fluctuations are studied in both the time and frequency domains, and the analytical models are presented to predict the resistance broadening for different RRAM states. Finally, the resistance dependence of noise and broadening is studied with the support of a 3-D finite-element model.
Keywords :
1/f noise; finite element analysis; resistive RAM; 1/f noise; 3-D finite-element model; RRAM; current fluctuation; intrinsic cell behavior; noise-induced resistance broadening; random telegraph noise; resistive switching memory; 1f noise; Analytical models; Electrical resistance measurement; Resistance; Silicon; Switches; 1/ $f$ noise; 1/f noise; low-frequency noise; memory reliability; random telegraph noise (RTN); reliability modeling; resistive switching memory (RRAM); resistive switching memory (RRAM).;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2475598
Filename :
7283598
Link To Document :
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