DocumentCode :
3607368
Title :
Quality Factor in Polycrystalline Diamond Micromechanical Flexural Resonators
Author :
Najar, Hadi ; Chen Yang ; Heidari, Amir ; Liwei Lin ; Horsley, David A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California at Davis, Davis, CA, USA
Volume :
24
Issue :
6
fYear :
2015
Firstpage :
2152
Lastpage :
2160
Abstract :
This paper reports an investigation into the various dissipation mechanisms that can affect polycrystalline diamond micromechanical resonators. Double-ended tuning fork and cantilever resonators were fabricated from 1-5-μm thick microcrystalline diamond films. It is shown that the quality factor of the low frequency (<;500 kHz) resonators is limited by surface loss, whereas the thermoelastic damping limits the quality factor of the higher frequency resonators. In resonators where surface loss is the dominant effect, the dependence of quality factor on resonator thickness is demonstrated. The addition of a lossy surface layer of Al2O3 deposited via atomic layer deposition is shown to degrade quality factor, and an experiment that further demonstrates the effect of surface dissipation and results in a reduction in quality factor that scales with the thickness of the Al2O3 layer. Heat treatment of cantilever resonators in N2 for various times up to 660 min is used to modify the resonator surface and is shown to result in a threefold increase in quality factor up to 365 000 at 26.6 kHz.
Keywords :
Q-factor; aluminium compounds; atomic layer deposition; micromechanical resonators; vibrations; Al2O3; atomic layer deposition; cantilever resonators; double-ended tuning fork; micromechanical flexural resonators; polycrystalline diamond; quality factor; size 1 mum to 5 mum; surface dissipation; thermoelastic damping; thick microcrystalline diamond films; Diamonds; Q-factor; Resonant frequency; Silicon; Surface treatment; Vibrations; Young´s modulus; Quality factor; diamond; diamond.; micromechanical resonators;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2015.2478802
Filename :
7286716
Link To Document :
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