Title :
Microstrip slow-wave line for phase shifting cells
Author :
Gastaldi, M. ; Dragomirescu, D. ; Takacs, A. ; Armengaud, V. ; Rochette, S.
Author_Institution :
LAAS, Toulouse, France
Abstract :
The design, simulation and measurements of microstrip slow-wave lines implemented in a 0.25 μm SiGe bipolar CMOS (BiCMOS) process is addressed for Ku-band (10-15 GHz) applications. The simulation results and the measurements show better performances for the proposed microstrip slow-wave line compared with the classical microstrip transmission line. These lines present very low insertion losses and a high phase constant.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; microstrip lines; microwave phase shifters; slow wave structures; BiCMOS process; Ku-band; SiGe; bipolar complementary metal oxide semiconductor; frequency 10 GHz to 15 GHz; insertion loss; microstrip slow wave line; microstrip transmission line; phase constant; phase shifting cell; size 0.25 mum;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2015.2148
