Title :
Survey on Run-to-Run Control Algorithms in High-Mix Semiconductor Manufacturing Processes
Author :
Fei Tan ; Tianhong Pan ; Zhengming Li ; Shan Chen
Author_Institution :
Sch. of Electr. & Inf. Eng., Jiangsu Univ., Zhenjiang, China
Abstract :
Recently, to ensure product quality in high-mix semiconductor manufacturing processes, run-to-run (R2R) control algorithms have received increasing attention. Difficult challenges have been met with new and advanced approaches that address the real-world operating conditions exhibited in high-mix production environments (e.g., different products with different frequencies and high numbers of threads). In this paper, various proposed controllers for high-mix semiconductor manufacturing processes are surveyed from an application and theoretical point of view. Remaining challenges and directions for future work are also summarized with the intent of drawing attention to these problems in the systems and process control communities.
Keywords :
manufacturing processes; process control; semiconductor industry; semiconductor technology; R2R control algorithms; high-mix production environments; high-mix semiconductor manufacturing process; process control communities; product quality; real-world operating conditions; run-to-run control algorithms; Context; Informatics; Instruction sets; Manufacturing processes; Process control; State estimation; Exponentially weighted moving average (EWMA); Run to Run control; exponentially weighted moving average (EWMA); high-mix production; non-threaded EWMA; nonthreaded EWMA; run-to-run (R2R) control; threaded EWMA;
Journal_Title :
Industrial Informatics, IEEE Transactions on
DOI :
10.1109/TII.2015.2490039