• DocumentCode
    3608157
  • Title

    Survey on Run-to-Run Control Algorithms in High-Mix Semiconductor Manufacturing Processes

  • Author

    Fei Tan ; Tianhong Pan ; Zhengming Li ; Shan Chen

  • Author_Institution
    Sch. of Electr. & Inf. Eng., Jiangsu Univ., Zhenjiang, China
  • Volume
    11
  • Issue
    6
  • fYear
    2015
  • Firstpage
    1435
  • Lastpage
    1444
  • Abstract
    Recently, to ensure product quality in high-mix semiconductor manufacturing processes, run-to-run (R2R) control algorithms have received increasing attention. Difficult challenges have been met with new and advanced approaches that address the real-world operating conditions exhibited in high-mix production environments (e.g., different products with different frequencies and high numbers of threads). In this paper, various proposed controllers for high-mix semiconductor manufacturing processes are surveyed from an application and theoretical point of view. Remaining challenges and directions for future work are also summarized with the intent of drawing attention to these problems in the systems and process control communities.
  • Keywords
    manufacturing processes; process control; semiconductor industry; semiconductor technology; R2R control algorithms; high-mix production environments; high-mix semiconductor manufacturing process; process control communities; product quality; real-world operating conditions; run-to-run control algorithms; Context; Informatics; Instruction sets; Manufacturing processes; Process control; State estimation; Exponentially weighted moving average (EWMA); Run to Run control; exponentially weighted moving average (EWMA); high-mix production; non-threaded EWMA; nonthreaded EWMA; run-to-run (R2R) control; threaded EWMA;
  • fLanguage
    English
  • Journal_Title
    Industrial Informatics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1551-3203
  • Type

    jour

  • DOI
    10.1109/TII.2015.2490039
  • Filename
    7296649