DocumentCode
3608157
Title
Survey on Run-to-Run Control Algorithms in High-Mix Semiconductor Manufacturing Processes
Author
Fei Tan ; Tianhong Pan ; Zhengming Li ; Shan Chen
Author_Institution
Sch. of Electr. & Inf. Eng., Jiangsu Univ., Zhenjiang, China
Volume
11
Issue
6
fYear
2015
Firstpage
1435
Lastpage
1444
Abstract
Recently, to ensure product quality in high-mix semiconductor manufacturing processes, run-to-run (R2R) control algorithms have received increasing attention. Difficult challenges have been met with new and advanced approaches that address the real-world operating conditions exhibited in high-mix production environments (e.g., different products with different frequencies and high numbers of threads). In this paper, various proposed controllers for high-mix semiconductor manufacturing processes are surveyed from an application and theoretical point of view. Remaining challenges and directions for future work are also summarized with the intent of drawing attention to these problems in the systems and process control communities.
Keywords
manufacturing processes; process control; semiconductor industry; semiconductor technology; R2R control algorithms; high-mix production environments; high-mix semiconductor manufacturing process; process control communities; product quality; real-world operating conditions; run-to-run control algorithms; Context; Informatics; Instruction sets; Manufacturing processes; Process control; State estimation; Exponentially weighted moving average (EWMA); Run to Run control; exponentially weighted moving average (EWMA); high-mix production; non-threaded EWMA; nonthreaded EWMA; run-to-run (R2R) control; threaded EWMA;
fLanguage
English
Journal_Title
Industrial Informatics, IEEE Transactions on
Publisher
ieee
ISSN
1551-3203
Type
jour
DOI
10.1109/TII.2015.2490039
Filename
7296649
Link To Document