• DocumentCode
    3608423
  • Title

    Charged Device Model Reliability of Three-Dimensional Integrated Circuits

  • Author

    Shukla, Vrashank ; Rosenbaum, Elyse

  • Author_Institution
    Univ. of Illinois at Urbana-Champaign, Champaign, IL, USA
  • Volume
    15
  • Issue
    4
  • fYear
    2015
  • Firstpage
    559
  • Lastpage
    566
  • Abstract
    The interdie signal interfaces in a three-dimensional (3-D) integrated circuit are vulnerable to overvoltage stress induced by charged device model (CDM) ESD, although they do not necessarily lie on any of the main ESD current paths. Circuit simulation shows that the magnitude of the stress is highly sensitive to the design of the ground distribution network on both the die and package levels. The placement of TSVs also impacts the stress generated at the interdie interfaces. If excessive, the voltage stress can be mitigated by placing a small ESD clamp at the interdie signal interface. A power supply domain may span multiple dies in a 3-D stack; this work investigates whether it is possible to remove the clamps from some of the dies in the stack to save silicon area without severely impacting the CDM reliability of the interdie interface circuits.
  • Keywords
    electrostatic discharge; integrated circuit reliability; power supply circuits; three-dimensional integrated circuits; 3D integrated circuit; 3D stack; CDM ESD; charged device model reliability; circuit simulation; die levels; ground distribution network design; interdie interface circuits; interdie signal interfaces; package levels; power supply domain; three-dimensional integrated circuits; Clamps; Discharges (electric); Electrostatic discharges; Integrated circuit modeling; Rails; Receivers; Stress; 3DIC; CDM; ESD; TSV;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2015.2491308
  • Filename
    7299296