DocumentCode :
3608423
Title :
Charged Device Model Reliability of Three-Dimensional Integrated Circuits
Author :
Shukla, Vrashank ; Rosenbaum, Elyse
Author_Institution :
Univ. of Illinois at Urbana-Champaign, Champaign, IL, USA
Volume :
15
Issue :
4
fYear :
2015
Firstpage :
559
Lastpage :
566
Abstract :
The interdie signal interfaces in a three-dimensional (3-D) integrated circuit are vulnerable to overvoltage stress induced by charged device model (CDM) ESD, although they do not necessarily lie on any of the main ESD current paths. Circuit simulation shows that the magnitude of the stress is highly sensitive to the design of the ground distribution network on both the die and package levels. The placement of TSVs also impacts the stress generated at the interdie interfaces. If excessive, the voltage stress can be mitigated by placing a small ESD clamp at the interdie signal interface. A power supply domain may span multiple dies in a 3-D stack; this work investigates whether it is possible to remove the clamps from some of the dies in the stack to save silicon area without severely impacting the CDM reliability of the interdie interface circuits.
Keywords :
electrostatic discharge; integrated circuit reliability; power supply circuits; three-dimensional integrated circuits; 3D integrated circuit; 3D stack; CDM ESD; charged device model reliability; circuit simulation; die levels; ground distribution network design; interdie interface circuits; interdie signal interfaces; package levels; power supply domain; three-dimensional integrated circuits; Clamps; Discharges (electric); Electrostatic discharges; Integrated circuit modeling; Rails; Receivers; Stress; 3DIC; CDM; ESD; TSV;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2015.2491308
Filename :
7299296
Link To Document :
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