Title :
901 nm Lithographic vertical-cavity surface-emitting laser with stable single-lobed beam pattern
Author :
Li, M. ; Yang, X. ; Zhang, Y. ; Zhao, G. ; Beadsworth, J. ; Eifert, L. ; Tucker, F. ; Deppe, D.G.
Author_Institution :
Coll. of Opt. & Photonics, Univ. of Central Florida, Orlando, FL, USA
Abstract :
Data are presented on 901 nm lithographic vertical-cavity surface-emitting lasers (VCSELs) demonstrating high efficiency for small VCSEL sizes, and stable beam patterns. Power conversion efficiency >40% is obtained for VCSELs ranging in size from 6 to 2 μm diameter. The 2 μm diameter VCSELs produce output powers in excess of 6.5 mW, and produce single-lobed far-field radiation patterns over the full range of operation.
Keywords :
lithography; surface emitting lasers; VCSEL; lithographic vertical cavity surface emitting laser; single-lobed far-field radiation patterns; size 2 mum to 6 mum; stable single lobed beam pattern; wavelength 901 nm;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2015.3003
