DocumentCode :
3608642
Title :
A Novel Flexible 3-D Heterogeneous Integration Scheme Using Electroless Plating on Chips With Advanced Technology Node
Author :
Yu-Chen Hu ; Chun-Pin Lin ; Yao-Jen Chang ; Nien-Shyang Chang ; Ming-Hwa Sheu ; Chi-Shi Chen ; Kuan-Neng Chen
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
62
Issue :
12
fYear :
2015
Firstpage :
4148
Lastpage :
4153
Abstract :
A novel 3-D chip-level heterogeneous integration scheme for low cost and rapid pilot demonstration is proposed in this paper. The conventional Bumping fabrication is done at wafer level. However, due to the high cost of whole wafer, opting for chips with advanced technology node is a better alternative. Therefore, with the difficulties of the bumping process at chip level, 3-D heterogeneous integration by chip stacking faces challenges. This paper presents a novel heterogeneous integration platform by using electroless plating on chips and pillar bump on wafers before stacking. This integration platform can be applied to chip-to-chip or chip-to-wafer scheme when chips are fabricated from costly advanced technology node.
Keywords :
three-dimensional integrated circuits; wafer-scale integration; 3D chip-level heterogeneous integration scheme; advanced technology node; bumping fabrication; chip stacking; chip-to-chip scheme; chip-to-wafer scheme; electroless plating; flexible 3D heterogeneous integration scheme; pillar bump; wafer level; Bonding; CMOS integrated circuits; Plating; Reliability; Resistance; Three-dimensional integrated circuits; Wafer scale integration; 3-D integration; heterogeneous; heterogeneous.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2487041
Filename :
7302023
Link To Document :
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