DocumentCode :
3609113
Title :
Transconductance improvement technique for bulk-driven OTA in nanometre CMOS process
Author :
Xiao Zhao ; Huajun Fang ; Tong Ling ; Jun Xu
Author_Institution :
Sch. of Geophys. & Inf. Technol., China Univ. of Geosci., Beijing, China
Volume :
51
Issue :
22
fYear :
2015
Firstpage :
1758
Lastpage :
1759
Abstract :
A transconductance improvement technique for a bulk-driven operational transconductance amplifier (OTA) working in the weak inversion region is presented. Using the quasi-floating gate method, the proposed technique achieves larger transconductance improvement than conventional approaches with the CMOS technologies scaling. Moreover, its enhanced performance is at no expense of the power budget. Simulated on UMC 180 nm technology, the results demonstrate that the proposed bulk-driven OTA achieves more than two times gain-bandwidth improvement than that of the traditional counterpart with the same power.
Keywords :
CMOS integrated circuits; operational amplifiers; CMOS technologies scaling; UMC 180 nm technology; bulk-driven OTA; bulk-driven operational transconductance amplifier; nanometre CMOS process; quasi-floating gate method; size 180 nm; transconductance improvement technique; weak inversion region;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2015.1559
Filename :
7308098
Link To Document :
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