Title :
Transparent JFETs Based on
-NiO/
-ZnO Heterojunctions
Author :
Karsthof, Robert ; von Wenckstern, Holger ; Grundmann, Marius
Author_Institution :
Fak. fur Phys. und Geowissenschaften, Univ. Leipzig, Leipzig, Germany
Abstract :
The fabrication of all-oxide junction-FETs consisting of n-type ZnO channels and p-type NiO gate electrodes with high optical transmission in the visible spectral range is reported. The influence of the channel layer thickness on the transfer characteristics in terms of ON-voltage, current ON/OFF ratio, and subthreshold slope was investigated. Best devices showed channel mobilities of around 4 cm2 V-1 s-1 , ON/OFF ratios of up to 3 × 107, and subthreshold slopes close to the thermal limit. The ON-voltage can be shifted from -3.5 to ~0 V when the channel thickness is decreased from 80 to 10 nm. At elevated temperatures of up to 100 °C, the devices remain fully operational. After the annealing cycle, the OFF-current is only slightly increased irreversibly. The frequency dependence of the switching behavior was investigated (gate-lag effect), and a high-frequency cutoff frequency at fc = 123 kHz was determined.
Keywords :
II-VI semiconductors; annealing; electrodes; junction gate field effect transistors; nickel compounds; visible spectra; wide band gap semiconductors; zinc compounds; NiO-ZnO; all-oxide junction-FET; annealing cycle; channel layer thickness; channel mobility; frequency 123 kHz; frequency dependence; n-type ZnO channels; optical transmission; p-NiO-n-ZnO heterojunctions; p-type NiO gate electrodes; switching behavior; transparent JFET; visible spectral range; Current measurement; II-VI semiconductor materials; JFETs; Nickel compounds; Temperature measurement; Threshold voltage; Zinc oxide; Junction-field effect transistor (JFET); nickel oxide (NiO); transparent electronic devices; zinc oxide (ZnO); zinc oxide (ZnO).;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2015.2490555