Title :
Germanium-on-Silicon Waveguide Engineering for Third Harmonic Generation in the Mid-Infrared
Author :
De Leonardis, Francesco ; Troia, Benedetto ; Soref, Richard A. ; Passaro, Vittorio M. N.
Author_Institution :
Dept. of Electr. & Inf. Eng., Politec. di Bari, Bari, Italy
Abstract :
In this paper, we propose the rigorous and sophisticated engineering of germanium-on-silicon waveguides for the efficient wavelength conversion from 10.60 to 3.53 μm and from 6 to 2 μm by means of third harmonic generation. In our investigation, the influence of waveguide fabrication tolerances, sidewall tilting angles, crystallographic axis orientation, laser wavelength drifts, and chromatic dispersion on the phase matching between the pump and harmonic optical modes, has been taken into account. Finally, conversion efficiencies as high as -35.68 and -23.46 dB have been achieved theoretically in optimized straight waveguides and resonant microcavities, respectively, with a pump wavelength of 10.60 μm.
Keywords :
Ge-Si alloys; crystal orientation; integrated optics; laser beams; micro-optics; microcavities; optical fabrication; optical harmonic generation; optical phase matching; optical pumping; optical resonators; optical waveguides; optical wavelength conversion; chromatic dispersion; crystallographic axis orientation; germanium-on-silicon waveguide engineering; harmonic optical mode; laser wavelength drifts; midinfrared region; optimized straight waveguides; phase matching; pump mode; pump wavelength; resonant microcavities; sidewall tilting angles; third harmonic generation; waveguide fabrication tolerances; wavelength 10.6 mum to 3.53 mum; wavelength 6 mum to 2 mum; wavelength conversion; Nonlinear optics; Optical device fabrication; Optical frequency conversion; Optical harmonic generation; Optical waveguides; Photonics; Germanium Technology; Germanium technology; Nonlinear optical devices; Optical waveguides; Third Harmonic Generation; nonlinear optical devices; optical waveguides; third harmonic generation;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2015.2496365