• DocumentCode
    3609744
  • Title

    A Novel Planar Waveguide Super-Multiple-Channel Optical Power Splitter

  • Author

    Chunsheng Li ; Xun Li ; Xinyou Qiu ; Yanping Xi

  • Author_Institution
    Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    33
  • Issue
    24
  • fYear
    2015
  • Firstpage
    5019
  • Lastpage
    5024
  • Abstract
    In this paper, we have proposed a novel planar waveguide optical-power-splitter design with a large number of splitting channels. The design uses the wavefront lateral interference in light propagation in a slab waveguide, with its core properly adjusted in different areas for achieving different effective indices for the required phase delays. Therefore, the whole structure is equivalent to a nonblocking all-pass filter, hence, suffers a very small insertion loss. Another unique advantage of this structure lies in its weak length dependence on the number of splitting channels; although its lateral size has to be scaled up as the channel number increases, as opposed to conventional splitters with both of its length and lateral size scaled up with increasing channel numbers. Our numerical simulation results show that, for a 1-to-256 channel splitter within a working wavelength band from 1530 to 1570 nm, the insertion loss is below 1.3 dB. The channel nonuniformity is less than 5 dB within the same band. The required size is within 2.5 mm by 10 mm on the silicon-on-insulator platform. The proposed structure can readily be extended to other material platforms, such as the silica-based planar lightwave circuit or semiconductors. Its fabrication process is fully compatible with standard clean-room technologies, such as photolithography and etching, without any complicated and/or costly approach involved.
  • Keywords
    all-pass filters; etching; light interference; light propagation; numerical analysis; optical beam splitters; optical design techniques; optical fabrication; optical materials; optical planar waveguides; photolithography; silicon compounds; silicon-on-insulator; SiO2; channel nonuniformity; channel number; conventional splitters; etching; fabrication process; insertion loss; light propagation; nonblocking all-pass filter; numerical simulation; phase delays; photolithography; planar waveguide optical-power-splitter design; planar waveguide super-multiple-channel optical power splitter; semiconductor materials; silica-based planar lightwave circuit; silicon-on-insulator platform; size 10 mm; size 2.5 mm; slab waveguide; splitting channels; standard clean-room technologies; wavefront lateral interference; wavelength 1530 nm to 1570 nm; Delays; Indexes; Insertion loss; Lenses; Optical device fabrication; Optical diffraction; Optical waveguides; Integrated optics; Optical beam splitting; Optical diffraction; Optical waveguides; optical beam splitting; optical diffraction; optical waveguides;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2015.2497719
  • Filename
    7317730