DocumentCode :
3609984
Title :
A Study of Gamma-Ray Exposure of Cu–SiO _2 Programmable Metallization Cells
Author :
Chen, W. ; Barnaby, H.J. ; Kozicki, M.N. ; Edwards, A.H. ; Gonzalez-Velo, Y. ; Fang, R. ; Holbert, K.E. ; Yu, S. ; Yu, W.
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
62
Issue :
6
fYear :
2015
Firstpage :
2404
Lastpage :
2411
Abstract :
The Cu-SiO2 based programmable metallization cell (PMC) is a promising alternative to the Ag-chalcogenide glass PMC because of its low power consumption and CMOS-compatibility. Understanding its total ionizing dose (TID) response helps in assessing the reliability of this technology in ionizing radiation environments and benefits its expansion in the space electronics market. In this paper, the impacts of TID on the switching characteristics of Cu-SiO2 PMC are investigated for the first time. The devices were step irradiated with 60Co gamma-rays to a maximum dose of 7.1 Mrad ( SiO2). The results show that gamma-ray irradiation has a negligible impact on the virgin-state and on-state resistance of Cu-SiO2 PMCs. The off-state resistance slightly decreases after the first 1.5 Mrad( SiO2) of exposure, but this reduction saturates after higher levels of TID. Other switching characteristics such as the set voltage, multilevel switching capability and endurance were also studied, all of which did not show observable changes after gamma-ray radiation. The immunity to ionizing radiation is attributed to the suppression of the photo-doping process.
Keywords :
chalcogenide glasses; copper; gamma-ray effects; metallisation; semiconductor doping; silicon compounds; silver; Ag; Cu-SiO2; PMC; TID; chalcogenide glass; gamma-ray exposure; gamma-ray irradiation; ionizing radiation; photodoping process; programmable metallization cells; space electronics market; total ionizing dose; Gamma-rays; Ionizing radiation; Nonvolatile memory; Radiation effects; Resistance; Silicon compounds; Switching circuits; ${hbox{SiO}}_2$; CMOS-compatibility; Conductive-bridging random access memory (CBRAM); gamma-ray radiation; nonvolatile memory; programmable metallization cell; resistive switching;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2015.2478883
Filename :
7322296
Link To Document :
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